ASML與台積電倡議 引領轉拓大尺寸光掩模

ASML與台積電倡議 引領轉拓大尺寸光掩模
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ASML和台積電聯合發起了一項產業合作計劃,旨在推動向12英寸光掩模(photomasks)的過渡,最大限度地發揮高數值孔徑(High NA)EUV光刻技術的價值。

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